Photovoltaic Wafer Cleaning System – High Volume Model

Wafer Specifications

• Size: 5" / 6" square silicon wafers

Capacity: 100 pcs × 2 slots

Trough Configuration (Customizable)

• 3 acid tanks
• 3 water rinse tanks
• 1 dryer unit

Process Control Features

• Chemical cycle automation
• Heating, concentration, and flow regulation
• Exhaust and discharge separation for acid, alkali, and organic solvents

Chemical Handling

• Compatible with CCSS / LCSS supply systems
• Automatic mixed acid blending •
• Optional chemical recovery or discharge setup
  

Software Control & Connectivity

• PC + PLC + GUI control architecture
• Communication protocols supported: SECS GEM, EAP, FDS, etc.

Reliability Metrics