Silicon Material Cleaning & Regeneration System

Cleaning Capacity

• Silicon Weight: 15kg / 20kg per batch (customizable) 
• Application: Wafer surface regeneration and impurity removal

Trough Configuration (Customizable)

• 2 Acid Tanks:
   -Glacial Acetic Acid
   -HNO₃ (Nitric Acid)
   -HF (Hydrofluoric Acid)
• 2 Water Rinse Tanks

Process Control Capabilities

• Chemical cycle optimization
• Precise heating, flow, and concentration control
• Segregated exhaust/discharge pathways for acid, alkali & organic solvents
  

Chemical Handling & Supply

• CCSS / LCSS compatible supply lines
• Automated mixed acid formulation
• Optional chemical recovery or discharge system

System Configuration Highlights

• Built-in Chiller Cooling System
• Integrated Monitoring Camera

Software & Protocol Support

• PC + PLC architecture with GUI control
• Protocols supported: SECS GEM / EAP / FDS and more

Reliability Metrics