Semi-Automatic Multi-Slot

Advanced Wafer Wet Process System

Wafer Handling

• Size range: 4–12 inches
• Capacity: 25 pcs × 1 cassette

Cassette Configuration

• 3 acid / 3 water or
• 4 acid / 4 water (customizable)

Process Control

• Chemical loop optimization
• Temperature and concentration control
• Precision flow regulation
• Segregated exhaust & discharge for acid/alkali/organic liquid

Chemical Liquid Management

• CCSS or LCSS supply
• Automatic mixed acid system
• Optional chemical recovery or discharge
  

System Hardware

• CO₂ fire extinguishing device
• Antistatic generator
• Built-in monitoring camera

Software Integration

• PC + PLC + GUI-based control
• Supports SECS GEM / EAP / FDS protocol sports SECS GEM / EAP / FDS protocols
  

Reliability Metrics