Chemical Process Control

• Chemical cycle automation
• Heating & concentration precision
• Flow rate regulation
• Optional dual/triple-frequency ultrasonic cleaning
• Segregated exhaust & discharge for acid / alkali / organic liquid

Chemical Management

• CCSS or LCSS supply support
• Automatic mixed acid system
• Optional chemical recovery or discharge setup

System Configuration

• CO₂ fire extinguishing device
• Antistatic generator
• Integrated camera

Photovoltaic Wafer Cleaning System

Application

Used for final cleaning of silicon wafers prior to shipment in cutting, grinding, and polishing facilities

Wafer & Trough Specifications

• Wafer Size: 5"/6" square wafers
• Capacity: 25 pcs × 4 slots
• Trough Setup: 4 acid / 4 water / 1 dryer (customizable)

Chemical Process Control

• Chemical cycle automation
• Heating & concentration precision
• Flow rate regulation
• Optional dual/triple-frequency ultrasonic cleaning
• Segregated exhaust & discharge for acid / alkali / organic liquids
  

Software & Protocols

• Control via PC + PLC + GUI interface
• Protocols supported: SECS GEM / EAP / FDS and more

Reliability Metrics