MOCVD Quartz Parts Cleaning System Overview 

Applicable Wafer/Part Type

• Designed for various MOCVD quartz components

Trough Configuration (Customizable)

• 1 Acid Tank: HNO₃ + HCl
• 1 Water Rinse Tank
• 1 Dryer Unit • Bottom Rotation Mechanism
• Tiltable Arm for Enhanced Coverage
  

Process Control Features

• Full chemical loop management
• Heating & concentration precision
• Flow rate regulation
• Segregated exhaust and discharge for acid / alkali / organic chemicals

Chemical Liquid Supply

• Compatible with CCSS / LCSS systems
• Automatic mixed acid generation
• Optional chemical recovery or discharge system
  

Software Configuration

• Integrated Monitoring Camera for process supervision
  
  

Software & Protocol Support

• PC + PLC control architecture
• GUI interface
• Communication protocols: SECS GEM / EAP / FDS, etc.

Reliability Metrics