Chemical Liquid Management

• CCSS or LCSS chemical supply integration
• Automatic mixed acid system
• Optional recovery or discharge system

System Configuration Highlights

• Megaacoustic nozzle for enhanced cleaning
• Antistatic generator
• Embedded camera monitoring system

High-Precision Wafer Cleaning System

Wafer Specifications

• Sizes supported: 150mm / 200mm / 300mm
• Capacity: 2 / 4 / 8 cavities (customizable)
• Handling Method: Vacuum or Grip

Chemical Process Capabilities

• Selectable: 2–5 chemical liquids
• Chemical loop automation
• Temperature, concentration & flow control
• Separated exhaust and discharge paths (Acid / Alkali / Organic compatibility)
  

Software & Protocol Integration

• Control architecture: PC + PLC + GUI interface
• Protocols supported: SECS GEM / EAP / FDS and more

Reliability Metrics