oUR pRODUCTS

Fully Automatic RCA Cleaning Machine

Software & Connectivity

  • PC + PLC + GUI control
  • Supports SECS GEM / EAP / FDS protocols


Reliability Metrics


Advanced Wafer Wet Process System


Wafer Capacity

  • Size: 4–12 inches
  • Load: 25 pcs × 1 or 2 cassettes


Cassette Configuration

  • 3 acid / 3 water or 4 acid / 4 water (customizable)


Process Control Features

  • Chemical loop control
  • Heating & concentration management
  • Precision flow regulation
  • Separated exhaust and discharge for acid/alkali/ organic liquids


Chemical Supply

  • CCSS / LCSS compatible
  • Automatic mixed acid system •
  • Recovery or discharge options available


System Hardware

  • CO₂ fire extinguishing device
  • Antistatic generator
  • Integrated camera