oUR pRODUCTS
Fully Automatic RCA Cleaning Machine

Software & Connectivity
- PC + PLC + GUI control
- Supports SECS GEM / EAP / FDS protocols
Reliability Metrics

Advanced Wafer Wet Process System
Wafer Capacity
- Size: 4–12 inches
- Load: 25 pcs × 1 or 2 cassettes
Cassette Configuration
- 3 acid / 3 water or 4 acid / 4 water (customizable)
Process Control Features
- Chemical loop control
- Heating & concentration management
- Precision flow regulation
- Separated exhaust and discharge for acid/alkali/ organic liquids
Chemical Supply
- CCSS / LCSS compatible
- Automatic mixed acid system •
- Recovery or discharge options available
System Hardware
- CO₂ fire extinguishing device
- Antistatic generator
- Integrated camera